ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,399, issued on July 21, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods and systems for filling a gap" was invented by ... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,400, issued on July 21, was assigned to Versum Materials US LLC (Tempe, Ariz.). "Composition and methods using same for carbon doped silico... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,401, issued on July 21, was assigned to Resonac Corp. (Tokyo). "Etching gas, etching method, and method for producing semiconductor device"... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,402, issued on July 21, was assigned to CENTRAL GLASS COMPANY Ltd. (Yamaguchi, Japan). "Surface treatment method, dry etching method, clean... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,403, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Halogen-free etching of silicon nitride" was invente... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,404, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods of selectively etching silicon nitride" was ... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,405, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Purge system to clean wafer backside for ring suscep... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,406, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Spacer patterning process with flat top profile" was... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,407, issued on July 21, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea) and SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). ... और पढ़ें
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,408, issued on July 21, was assigned to KIOXIA Corp. (Tokyo). "Substrate processing apparatus and method for manufacturing semiconductor de... और पढ़ें